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Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size

Crossref DOI link: https://doi.org/10.7567/JJAP.55.106502

Published Online: 2016-09-20

Published Print: 2016-10-01

Update policy: https://doi.org/10.1088/crossmark-policy

Authors

Kozawa, Takahiro
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Article Title: Theoretical study of fabrication of line-and-space patterns with 7 nm quarter-pitch using electron beam lithography with chemically amplified resist process: V. Optimum beam size

Journal Title: Japanese Journal of Applied Physics

Article Type: paper

Copyright Information: © 2016 The Japan Society of Applied Physics

Publication dates

Date Received: 2016-06-26

Date Accepted: 2016-07-22

Online publication date: 2016-09-20

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