Crossmark

Fabrication of interdigitated back-contact silicon heterojunction solar cells on a 53-µm-thick crystalline silicon substrate by using the optimized inkjet printing method for etching mask formation

Crossref DOI link: https://doi.org/10.7567/JJAP.56.040308

Published Online: 2017-03-17

Published Print: 2017-04-01

Update policy: https://doi.org/10.1088/crossmark-policy

Authors

Takagishi, Hideyuki https://orcid.org/0000-0003-2609-5549
Noge, Hiroshi

Saito, Kimihiko

Kondo, Michio
License Information

Text and Data Mining valid from 2017-03-17

Version of Record valid from 2017-03-17
More Information

Journal title: Japanese Journal of Applied Physics

Article type: lett

Article title: Fabrication of interdigitated back-contact silicon heterojunction solar cells on a 53-µm-thick crystalline silicon substrate by using the optimized inkjet printing method for etching mask formation

Copyright information: © 2017 The Japan Society of Applied Physics

Publication dates

Date received: 2017-01-20

Date accepted: 2017-02-24

Online publication date: 2017-03-17

Document is current

Any future updates will be listed below