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Theoretical study on effects of photodecomposable quenchers in line-and-space pattern fabrication with 7 nm quarter-pitch using chemically amplified electron beam resist process

Crossref DOI link: https://doi.org/10.7567/JJAP.56.046502

Published Online: 2017-02-27

Published Print: 2017-04-01

Update policy: https://doi.org/10.1088/crossmark-policy

Authors

Kozawa, Takahiro
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Journal title: Japanese Journal of Applied Physics

Article type: paper

Article title: Theoretical study on effects of photodecomposable quenchers in line-and-space pattern fabrication with 7 nm quarter-pitch using chemically amplified electron beam resist process

Copyright information: © 2017 The Japan Society of Applied Physics

Publication dates

Date received: 2016-12-06

Date accepted: 2017-01-18

Online publication date: 2017-02-27

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