Miyoshi, Nobuya
Kobayashi, Hiroyuki
Shinoda, Kazunori
Kurihara, Masaru
Watanabe, Tomoyuki
Kouzuma, Yutaka
Yokogawa, Kenetsu
Sakai, Satoshi
Izawa, Masaru
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: Atomic layer etching of silicon nitride using infrared annealing for short desorption time of ammonium fluorosilicate
Copyright information: © 2017 The Japan Society of Applied Physics
Publication dates
Date received: 2016-12-21
Date accepted: 2017-01-08
Online publication date: 2017-04-28