Matsui, Miyako
Usui, Tatehito
Ono, Tetsuo
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: Effect of plasma dissociation on fluorocarbon layers formed under C4F8/Ar pulsed plasma for SiO2etching
Copyright information: © 2017 The Japan Society of Applied Physics
Publication dates
Date received: 2016-11-24
Date accepted: 2016-12-26
Online publication date: 2017-05-11