Takai, Shinnosuke
Lu, Yi
Oda, Osamu
Takeda, Keigo
Kondo, Hiroki
Ishikawa, Kenji
Sekine, Makoto
Hori, Masaru
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: Growth of InN films by radical-enhanced metal organic chemical vapor deposition at a low temperature of 200 °C
Copyright information: © 2017 The Japan Society of Applied Physics
Publication dates
Date received: 2017-01-14
Date accepted: 2017-03-22
Online publication date: 2017-05-26