Takeuchi, Wakana
Washizu, Tomoya
Ike, Shinichi
Nakatsuka, Osamu
Zaima, Shigeaki
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: Selective growth of Ge1−xSnxepitaxial layer on patterned SiO2/Si substrate by metal–organic chemical vapor deposition
Copyright information: © 2018 The Japan Society of Applied Physics
Publication dates
Date received: 2017-05-15
Date accepted: 2017-10-16
Online publication date: 2017-12-21