Ozaki, Yuki
Ito, Shunya
Hiroshiba, Nobuya
Nakamura, Takahiro
Nakagawa, Masaru
Funding for this research was provided by:
Japan Society for the Promotion of Science (15H03860)
Japan Society for the Promotion of Science (16K20912)
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: Elemental depth profiles and plasma etching rates of positive-tone electron beam resists after sequential infiltration synthesis of alumina
Copyright information: © 2018 The Japan Society of Applied Physics
Publication dates
Date received: 2017-11-30
Date accepted: 2018-01-12
Online publication date: 2018-05-02