Ishikawa, Kenji https://orcid.org/0000-0002-8288-6620
Karahashi, Kazuhiro https://orcid.org/0000-0001-9951-6573
Ishijima, Tatsuo https://orcid.org/0000-0002-5237-3699
Cho, Sung Il
Elliott, Simon
Hausmann, Dennis
Mocuta, Dan
Wilson, Aaron
Kinoshita, Keizo
Journal title: Japanese Journal of Applied Physics
Article type: rev
Article title: Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?
Copyright information: © 2018 The Japan Society of Applied Physics
License information: cc-by Content from this work may be used under the terms of the Creative Commons Attribution 4.0 license. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.
Publication dates
Date received: 2018-03-16
Date accepted: 2018-03-24
Online publication date: 2018-05-25