Ishii, Yohei
Scott-McCabe, Ritchie
Yu, Alex
Okuma, Kazumasa
Maeda, Kenji
Sebastian, Joseph
Manos, Jim
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: Anisotropic selective etching between SiGe and Si
Copyright information: © 2018 The Japan Society of Applied Physics
Publication dates
Date received: 2017-12-31
Date accepted: 2018-03-09
Online publication date: 2018-05-22