Arshad, Muhammad Zeeshan https://orcid.org/0000-0003-4397-270X
Jo, Kyung Jae https://orcid.org/0000-0003-4398-0021
Kim, Hyun Gi https://orcid.org/0000-0024-0173-497X
Hong, Sang Jeen https://orcid.org/0000-0002-6576-690X
Article Title: Optical in situ monitoring of plasma-enhanced atomic layer deposition process
Journal Title: Japanese Journal of Applied Physics
Article Type: paper
Copyright Information: © 2018 The Japan Society of Applied Physics. All rights, including for text and data mining, AI training, and similar technologies, are reserved.
Publication dates
Date Received: 2017-11-14
Date Accepted: 2018-02-13
Online publication date: 2018-05-29