Tu, Huynh Thi Cam
Koyama, Koichi
Nguyen, Cong Thanh
Ohdaira, Keisuke
Matsumura, Hideki
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: High-quality surface passivation of crystalline silicon with chemical resistance and optical transparency by using catalytic chemical vapor deposition SiN x layers and an ultrathin SiO x film
Copyright information: © 2018 The Japan Society of Applied Physics
Publication dates
Date received: 2017-12-16
Date accepted: 2018-03-09
Online publication date: 2018-07-17