Kumakura, Sho
Tabata, Masahiro
Honda, Masanobu
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: A method for high selective etch of Si3N4 and SiC with ion modification and chemical removal
Copyright information: © 2019 The Japan Society of Applied Physics
Publication dates
Date received: 2019-01-09
Date accepted: 2019-03-27
Online publication date: 2019-05-17