Zhu, Zhen http://orcid.org/0000-0002-5040-7189
Sippola, Perttu
Lipsanen, Harri http://orcid.org/0000-0003-2487-4645
Savin, Hele http://orcid.org/0000-0003-3946-7727
Merdes, Saoussen http://orcid.org/0000-0002-0887-9377
Journal title: Japanese Journal of Applied Physics
Article type: paper
Article title: Influence of plasma parameters on the properties of ultrathin Al2O3 films prepared by plasma enhanced atomic layer deposition below 100 °C for moisture barrier applications
Copyright information: © 2018 The Japan Society of Applied Physics
License information: cc-by Content from this work may be used under the terms of the Creative Commons Attribution 4.0 license. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.
Publication dates
Date received: 2018-07-26
Date accepted: 2018-09-05
Online publication date: 2018-10-25