Impact of Buried Oxide Layer Thickness on the Performance Parameters of SOI FinFET at 22 nm Node Technology
Crossref DOI link: https://doi.org/10.1007/978-981-10-5903-2_54
Published Online: 2018-04-11
Published Print: 2018
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Kaur, Ravneet
Madhu, Charu
Singh, Deepti
License valid from 2018-01-01