Modeling and Simulation of SU-8 Thick Photoresist Lithography
Crossref DOI link: https://doi.org/10.1007/978-981-10-5945-2_3
Published Online: 2018-04-20
Published Print: 2018
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Zhou, Zai-Fa
Huang, Qing-An
License valid from 2018-01-01