Development of High-Endurance and Long-Retention FeFETs of Pt/CaySr1−yBi2Ta2O9/(HfO2)x(Al2O3)1−x/Si Gate Stacks
Crossref DOI link: https://doi.org/10.1007/978-981-15-1212-4_2
Published Online: 2020-03-24
Published Print: 2020
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Takahashi, Mitsue
Sakai, Shigeki
Text and Data Mining valid from 2020-01-01
Chapter History
First Online: 24 March 2020