Performance Enhancement of SiGe-Based Junctionless Tri-Gate (JL-TG) FinFETs Using Hetero-High-K Gate Oxide Material
Crossref DOI link: https://doi.org/10.1007/978-981-19-2631-0_47
Published Online: 2022-10-05
Published Print: 2022
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Awasthi, Himanshi
Sigroha, Deepak
Varshney, Vikrant
Rai, Manish Kumar
Rai, Sanjeev
Gupta, Abhinav
Text and Data Mining valid from 2022-01-01
Version of Record valid from 2022-01-01
Chapter History
First Online: 5 October 2022