An analytical investigation of pad wear caused by the conditioner in fixed abrasive chemical–mechanical polishing
Crossref DOI link: https://doi.org/10.1007/s00170-014-6490-3
Published Online: 2014-10-28
Published Print: 2015-03
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Nguyen, N. Y.
Zhong, Z. W.
Tian, Yebing
Text and Data Mining valid from 2014-10-28