Crossmark

Material removal model of chemical mechanical polishing for fused silica using soft nanoparticles

Crossref DOI link: https://doi.org/10.1007/s00170-016-9069-3

Published Online: 2016-06-22

Published Print: 2017-02

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Liu, Defu

Chen, Guanglin

Hu, Qing
Funding

Funding for this research was provided by:

National Natural Science Foundation of China (51275534)

Natural Science Foundation of Hunan province of China (2015JJ2153)
License Information

License valid from 2016-06-22