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Impact of rapid thermal annealing on impurities removal efficiency from silicon carbide for optoelectronic applications

Published Online: 2019-11-27

Published Print: 2020-01

Authors

Barbouche, M. https://orcid.org/0000-0001-7450-2562
Zaghouani, R. Benabderrahmane

Benammar, N.E.

Khirouni, K.

Turan, R.

Ezzaouia, H.
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Text and Data Mining valid from 2019-11-27

Version of Record valid from 2019-11-27
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Article History

Received: 13 July 2019

Accepted: 4 October 2019

First Online: 27 November 2019

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