Optimization of polishing path and material removal for uniform material removal in optical surface polishing
Crossref DOI link: https://doi.org/10.1007/s00170-022-10464-0
Published Online: 2022-12-03
Published Print: 2023-01
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Qu, Xingtian
Liu, Qinglong
Wang, Hongyi
Liu, Haizhong
Liu, Jiming
Sun, Huichao
Text and Data Mining valid from 2022-12-03
Version of Record valid from 2022-12-03
Article History
Received: 12 June 2022
Accepted: 5 November 2022
First Online: 3 December 2022
Declarations
:
: The authors declare no competing interests.