Optical characteristics of H2O-based and O3-based HfO2 films deposited by ALD using spectroscopy ellipsometry
Crossref DOI link: https://doi.org/10.1007/s00339-015-9048-9
Published Online: 2015-02-15
Published Print: 2015-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fan, Xiaojiao
Liu, Hongxia
Zhong, Bo
Fei, Chenxi
Wang, Xing
Wang, Qianqiong
Text and Data Mining valid from 2015-02-15