Role of deposition temperature on performance of HfO x -based resistive switching
Crossref DOI link: https://doi.org/10.1007/s00339-015-9178-0
Published Online: 2015-04-16
Published Print: 2015-07
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Guo, Tingting
Tan, Tingting
Liu, Zhengtang
Text and Data Mining valid from 2015-04-16