A step toward next-generation nanoimprint lithography: extending productivity and applicability
Crossref DOI link: https://doi.org/10.1007/s00339-015-9229-6
Published Online: 2015-05-27
Published Print: 2015-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Ok, Jong G.
Shin, Young Jae
Park, Hui Joon
Guo, L. Jay
Text and Data Mining valid from 2015-05-27