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Cu/TiO2 thin films prepared by reactive RF magnetron sputtering

Crossref DOI link: https://doi.org/10.1007/s00339-015-9254-5

Published Online: 2015-06-06

Published Print: 2015-08

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Sreedhar, M.

Reddy, I. Neelakanta https://orcid.org/0000-0003-2713-962X
Bera, Parthasarathi

Ramachandran, D.

Gobi Saravanan, K.

Rabel, Arul Maximus

Anandan, C.

Kuppusami, P.

Brijitta, J.
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