Effect of substrate temperature on microstructure and electrical properties of LaNiO3 films grown on SiO2/Si substrates by pulsed laser deposition under a high oxygen pressure
Crossref DOI link: https://doi.org/10.1007/s00339-016-0448-2
Published Online: 2016-09-21
Published Print: 2016-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
He, Bin
Wang, Zhanjie
License valid from 2016-09-21