Effects of dopant type and concentration on the femtosecond laser ablation threshold and incubation behaviour of silicon
Crossref DOI link: https://doi.org/10.1007/s00339-016-9969-y
Published Online: 2016-03-23
Published Print: 2016-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Oosterbeek, Reece N.
Corazza, Carsten
Ashforth, Simon
Simpson, M. Cather
Funding for this research was provided by:
Ministry of Business, Innovation and Employment (UOAX1202, UOAX1416)
Text and Data Mining valid from 2016-03-23