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Impacts of excimer laser annealing on Ge epilayer on Si

Crossref DOI link: https://doi.org/10.1007/s00339-017-0793-9

Published Online: 2017-02-07

Published Print: 2017-02

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

Huang, Zhiwei

Mao, Yichen

Yi, Xiaohui

Lin, Guangyang

Li, Cheng

Chen, Songyan

Huang, Wei

Wang, Jianyuan
Funding

Funding for this research was provided by:

National Basic Research Program of China (No. 2013CB632103)

National Basic Research Program of China (No. 2012CB933503)

National Natural Science Foundation of China (No.61474094)
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License valid from 2017-02-01