Dependence of O2 and Ar2 flow rates on the physical properties of ATO thin films deposited by atmospheric pressure chemical vapor deposition (APCVD)
Crossref DOI link: https://doi.org/10.1007/s00339-017-1229-2
Published Online: 2017-10-24
Published Print: 2017-11
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Fadavieslam, M. R. http://orcid.org/0000-0003-3981-8697
Sadra, S.
License valid from 2017-10-24