Structural and magnetic properties of copper oxide films deposited by DC magnetron reactive sputtering
Crossref DOI link: https://doi.org/10.1007/s00339-018-2141-0
Published Online: 2018-10-01
Published Print: 2018-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Radjehi, L.
Djelloul, A.
Bououdina, M. http://orcid.org/0000-0001-8770-7129
Siab, R.
Tebib, W.
Text and Data Mining valid from 2018-10-01
Article History
Received: 11 July 2018
Accepted: 27 September 2018
First Online: 1 October 2018