Studying of SiO2/capron nanocomposite as a gate dielectric film for improved threshold voltage
Crossref DOI link: https://doi.org/10.1007/s00339-019-2547-3
Published Online: 2019-03-16
Published Print: 2019-04
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Bahari, Ali
Ghovati, Mahya
Hashemi, Adeleh
Text and Data Mining valid from 2019-03-16
Article History
Received: 6 January 2019
Accepted: 6 March 2019
First Online: 16 March 2019