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Fabrication and characterization of Sr0.8Bi2.2Ta2O9 /Al2O3 gate stack for ferroelectric field effect transistors

Published Online: 2021-01-15

Published Print: 2021-02

Authors

Kumar Jha, Rajesh https://orcid.org/0000-0002-5903-8105
Singh, Prashant
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Text and Data Mining valid from 2021-01-15

Version of Record valid from 2021-01-15
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Article History

Received: 11 November 2020

Accepted: 6 January 2021

First Online: 15 January 2021

Compliance with ethical standards

:

: The author does not have any conflict of interest to disclose.

Document is current