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Implications of the HF/H2O2 effect on the electrochemical etching formation of macroporous silicon at various etching times

Crossref DOI link: https://doi.org/10.1007/s00339-024-08140-z

Published Online: 2025-01-04

Published Print: 2025-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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