Ultraviolet femtosecond pulses: Key technology for sub-micron machining and efficient XUV pulse generation
Crossref DOI link: https://doi.org/10.1007/s00340-002-0875-y
Published Online: 2014-04-24
Published Print: 2002-06
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Simon, P.
Bekesi, J.
Dölle, C.
Klein-Wiele, J.-H.
Marowsky, G.
Szatmari, S.
Wellegehausen, B.
Text and Data Mining valid from 2002-06-01