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Properties of ScxAl1-xN (x = 0.27) thin films on sapphire and silicon substrates upon high temperature loading

Crossref DOI link: https://doi.org/10.1007/s00542-015-2798-7

Published Online: 2015-12-30

Published Print: 2016-07

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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