Anisotropic etching of silicon in KOH + Triton X-100 for 45° micromirror applications
Crossref DOI link: https://doi.org/10.1007/s00542-016-3103-0
Published Online: 2016-08-30
Published Print: 2017-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Rola, Krzysztof P.
Funding for this research was provided by:
European Regional Development Fund (POIG.01.01.02-00-008/08-05)
License valid from 2016-08-30