Single layer thin photoresist soft etch mask for MEMS applications
Crossref DOI link: https://doi.org/10.1007/s00542-017-3609-0
Published Online: 2017-10-28
Published Print: 2018-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Joyce, Robin
Panwar, Deepak Kumar
Shakil, Moh.
Varghese, Soney
Akhtar, Jamil
License valid from 2017-10-28