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Step coverage of the barrier films deposited onto patterned photoresist

Published Online: 2018-01-08

Published Print: 2018-10

Authors

Chen, Tai-Hong

Chang, Chun-Hao

Lin, Sheng-Fu

Su, Yong-Ji

Liu, Hua-Wen

Chen, Shun-Chi

Liu, Day-Shan
Funding

Funding for this research was provided by:

Industrial Technology Research Institute (TW) (A200-106BA2)
License Information

Text and Data Mining valid from 2018-01-08

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