Optimization of laser writer-based UV lithography with high magnification optics to pattern X-ray lithography mask templates
Crossref DOI link: https://doi.org/10.1007/s00542-018-4161-2
Published Online: 2018-10-09
Published Print: 2019-08
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Achenbach, S. http://orcid.org/0000-0003-0488-1557
Hengsbach, S.
Schulz, J.
Mohr, J.
Text and Data Mining valid from 2018-10-09
Article History
Received: 3 September 2018
Accepted: 28 September 2018
First Online: 9 October 2018