Effects of different annealing temperature on the optoelectrical properties of MGZO thin films prepared by co-sputtering method
Crossref DOI link: https://doi.org/10.1007/s00542-019-04360-z
Published Online: 2019-02-25
Published Print: 2019-05
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Chen, Tao-Hsing https://orcid.org/0000-0002-5433-1812
Wang, Min-Wen
Yang, Chia-Ling
Huang, Yu-Sheng
Funding for this research was provided by:
Ministry of Science and Technology, Taiwan (MOST 106-2628-E-992-302-MY3)
Text and Data Mining valid from 2019-02-25
Article History
Received: 7 January 2019
Accepted: 14 February 2019
First Online: 25 February 2019