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Fabrication of the microfluidic channels in silicon wafers using isotropic wet etching method: the impact of the composition of HNA solution on etching

Crossref DOI link: https://doi.org/10.1007/s00542-024-05688-x

Published Online: 2024-05-16

Published Print: 2025-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

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