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Dip-coating deposition of resistive BiVO4 thin film and evaluation of their photoelectrochemical parameters under distinct sources illumination

Crossref DOI link: https://doi.org/10.1007/s10008-016-3166-y

Published Online: 2016-02-27

Published Print: 2016-06

Update policy: https://doi.org/10.1007/springer_crossmark_policy

Authors

da Silva, M. R.

Scalvi, L. V. A.

Neto, V. S. L.

Dall’Antonia, L. H.
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