Bond strength of etch-and-rinse and self-etch adhesive systems to enamel and dentin irradiated with a novel CO2 9.3 μm short-pulsed laser for dental restorative procedures
Crossref DOI link: https://doi.org/10.1007/s10103-017-2302-y
Published Online: 2017-08-15
Published Print: 2017-12
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Rechmann, Peter http://orcid.org/0000-0003-0282-7426
Bartolome, N.
Kinsel, R.
Vaderhobli, R.
Rechmann, B. M. T.
Funding for this research was provided by:
UCSF/Convergent Dental Inc
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