Soft lithography based on photolithography and two-photon polymerization
Crossref DOI link: https://doi.org/10.1007/s10404-018-2118-5
Published Online: 2018-08-23
Published Print: 2018-09
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Lin, Yang http://orcid.org/0000-0002-8261-8984
Gao, Can
Gritsenko, Dmitry
Zhou, Ran
Xu, Jie
Funding for this research was provided by:
National Aeronautics and Space Administration (80NSSC17K0522)
Text and Data Mining valid from 2018-08-23
Version of Record valid from 2018-08-23
Article History
Received: 13 April 2018
Accepted: 16 August 2018
First Online: 23 August 2018