Measurement of residual stress in a multi-layer semiconductor heterostructure by micro-Raman spectroscopy
Crossref DOI link: https://doi.org/10.1007/s10409-016-0591-1
Published Online: 2016-07-12
Published Print: 2016-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Qiu, Wei
Cheng, Cui-Li
Liang, Ren-Rong
Zhao, Chun-Wang
Lei, Zhen-Kun
Zhao, Yu-Cheng
Ma, Lu-Lu
Xu, Jun
Fang, Hua-Jun
Kang, Yi-Lan
License valid from 2016-07-12