Heterojunction (SiGe/Si) triple metal dual gate extended source tunnel FET for improved DC, noise and linearity performance
Crossref DOI link: https://doi.org/10.1007/s10470-025-02492-z
Published Online: 2025-09-04
Published Print: 2025-10
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Singh, Sheetal
Wairya, Subodh
Text and Data Mining valid from 2025-09-04
Version of Record valid from 2025-09-04
Article History
Received: 6 August 2025
Revised: 20 August 2025
Accepted: 24 August 2025
First Online: 4 September 2025
Declarations
:
: The authors declare no competing interests.