Document is current

Any future updates will be listed below

Ferroelectric gate oxide design and performance analysis in nanowire MFIS structure using silicon and InAs materials

Crossref DOI link: https://doi.org/10.1007/s10470-025-02535-5

Published Online: 2025-11-21

Published Print: 2026-01

Update policy: https://doi.org/10.1007/springer_crossmark_policy

About CrossMark