Photolithographic patterning of cellulose: a versatile dual-tone photoresist for advanced applications
Crossref DOI link: https://doi.org/10.1007/s10570-014-0471-4
Published Online: 2014-10-16
Published Print: 2015-02
Update policy: https://doi.org/10.1007/springer_crossmark_policy
Wolfberger, Archim
Petritz, Andreas
Fian, Alexander
Herka, Jakob
Schmidt, Volker
Stadlober, Barbara
Kargl, Rupert
Spirk, Stefan
Griesser, Thomas
License valid from 2014-10-16