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Optimization of process parameters for the pseudocapacitive properties of Cu2O thin films prepared by r.f. magnetron sputtering

Published Online: 2026-03-14

Authors

Shaik, Dadamiah P. M. D.

Lakkimsetty, Nageswara Rao

Karu, Clement Varaprasad
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Text and Data Mining valid from 2026-03-14

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Article History

Received: 11 December 2025

Accepted: 14 February 2026

First Online: 14 March 2026

Declarations

:

: The authors declare no competing interests.

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